01155nas a2200157   4500008004100000245009900041210006900140300000800209490000700217520065000224100001700874700001800891700001900909700002000928856004900948       2005                        eng d00aAnnealing effects on the properties of copper oxide thin films prepared by chemical deposition0 aAnnealing effects on the properties of copper oxide thin films p  a3980 v203 aWe have investigated the annealing effect on the structural, optical and electrical properties of copper oxide films prepared on glass substrates by chemical deposition. The films were annealed in air for different temperatures ranging from 200 to 350 °C. X-ray diffraction patterns showed that the films as-deposited and annealed at 200 and 250 °C are of cuprite structure with composition Cu 2 O. Annealing at 300 °C converts these films to CuO. This conversion is accompanied by a shift in the optical band gap from 2.20 eV to 1.35 eV. Also this conversion was obtained by the dc electrical conductivity and FTIR spectroscopy measurements.1 aSerin, Necmi1 aSerin, Tülay1 aHorzum, Şeyda1 aÇelik, Yasemin  uhttp://stacks.iop.org/0268-1242/20/i=5/a=012